
Getting Ready For the OS/390 (MVS) Standard System
The planning stages for the consolidation of the MVS North and South systems into a new OS/390 standard system are nearing completion. The standard system is being designed to combine the best functions of both the North and South systems in a single platform whose environment will be more cost-effective and will offer reduced rates to customers. The standard system eliminates the
customization that exists in the current systems. Thus it will greatly increase CIT’s ability to move quickly and efficiently to new technologies and to adopt emerging COTS products for increased functionality.
Timetable
CIT is working vigorously to have this system operational and ready to accept production work by the end of fiscal year 2000. CIT’s long-term goal is to complete the migration of the existing MVS systems to the standard system within the subsequent 18 to 24 months.
How Will This Affect Me?
Seminars will be provided to keep users informed and aware of the progress being made towards implementing the standard system. The first seminar will be held May 19, 2000, in NIH building 12A (room B51 at 9 A.M.). Sign up for this seminar via TASC’s training Web page at http://training.cit.nih.gov.
North and South system application owners and account sponsors/ADP coordinators are encouraged to attend this first seminar, which will focus on the following topics:
Why the standard system? With information learned at this initial seminar, you can more effectively begin plans for the migration of your applications to the new platform. Members of the CIT staff will be available to work with you on the migration.
How will this affect me?
What changes will be made?
What is the timeline?
How do I do transition planning?
How will you communicate updates on progress?
A Web Page for Current Information
In addition to the classes, users may get current information about the progress of standard systemand communicate with standard system staffvia http://silk.nih.gov/silk/standardsystem.
Interface 213 (March 15, 2000)
